Source measure unit boosts DC channel density RF, MEMS, and mixed-signal IC testing

February 07, 2018 // By Julien Happich
NI's PXIe-4163 high-density source measure unit (SMU) provides six times more DC channel density than the company's previous PXI SMUs for testing RF, MEMS, and mixed-signal and other analog semiconductor components.

Chipmakers have rapidly adopted the Semiconductor Test System (STS) for its throughput, performance at cost and footprint on the production floor. The new PXIe-4163 SMU further complements these capabilities. It delivers increased DC channel density for higher parallelism in multisite applications and lab-grade measurement quality in a production-ready form factor. Engineers can take advantage of this combination to use the same instrumentation in the validation lab and the production floor, which reduces challenges with measurement correlation and shortens time to market. Engineers can use the new PXIe-4163 SMU in either STS configurations or stand-alone PXI systems. The system offers up to 24 channels in a single PXI Express slot with +/- 24V per channel and up to 100mA source/sink per channel with a 100pA current sensitivity. The instrument supports up to 100 kS/s sampling rate and update rate. The SourceAdapt feature minimizes overshoot and oscillations and interactive configuration and debug software are delivered with the hardware.

NI -  www.ni.com