Inpria Corp. (Corvallis, Oregon) was founded in 2007 and originally received backing from Samsung Venture Investment Corp., Intel Capital and Applied Ventures to help it bring photo-condensed molecular oxide photoresist to market.
More than ten years on and EUV lithography is a reality in the market. Inpria has raised $31 million in a Series C round of funding led by materials supplier JSR Corp. Investors new to his round included SK Hynix Inc. and TSMC Partners. The round also included participation from existing investors Air Liquide Venture Capital ALIAD, Applied Ventures, Intel Capital and Samsung Ventures.
Inpria raised a Series B round worth $23.5 million in 2017.
The company's photoresists are comprised of tin-oxide nanoclusters of molecules. These building blocks are smaller than those in traditional polymer-based resists which are tuned to optimally absorb EUV photons. Inpria's claim is that its photoresists allow simpler manufacturing flows and larger process windows making things easier for chip manufacturers.
Inpria recently brought its high-volume manufacturing plant online to support the initial production ramp for customers.
Comprised of tin-oxide nanoclusters, Inpria photoresists deliver higher resolution with building blocks a fraction the size of traditional polymer-based resists which are tuned to optimally absorb EUV photons. With unparalleled etch selectivity, Inpria photoresists enable simpler manufacturing flows and larger process windows for an overall reduction in cost of ownership. Inpria recently brought online its high-volume manufacturing plant to support the initial production ramp for customers.
A rival to Inpria is Irresistible Materials, which supplies a multi-trigger resist based on a small molecule polymer (see Armbrust replaces retiring McIntosh as chair at Irresistible ).
Andrew Grenville, CEO of Inpria, said: "We believe our investor participation serves as an indicator for Inpria’s strategic significance to the semiconductor industry. We are delighted that our investor base now includes all semiconductor manufacturers worldwide that are currently adopting EUV patterning. This achievement is complemented by the strong participation of photoresist, equipment and