US lobbied hard to deny China EUV lithography: Page 2 of 2

January 13, 2020 // By Peter Clarke
US lobbied hard to deny China EUV lithography
The US government pushed hard for a Dutch decision not to renew a "dual-use" license to export an extreme ultraviolet lithography stepper to China, according to a Reuters report.

Reuters said that in July 2019 Deputy National Security Advisor Charles Kupperman gave Netherlands Prime Minister Mark Rutte an intelligence report on the potential repercussions of China gaining access to ASML's EUV lithography.

ASML's export license had expired on June 30 2019 and no new license was granted in the following eight-week period during which a renewal would normally be considered.

The Reuters report adds that the US administration said it is considering reducing the percentage requirement under Wassenaar for certain types of equipment.

Although EUV lithography tool could cost up to $100 million ASML is a near monopoly supplier of lithography equipment and has large sales out of China for previous generations of equipment.

China's leading semiconductor equipment supplier is Advanced Micro-Fabrication Equipment Inc. China (AMEC) with expertise in both etch equipment and MOCVD.

Related links and articles:

Reuters report

Book review: ASML's Architects

News articles:

ASML delays Chinese delivery of EUV lithography tool

They were thieves not spies, says ASML

ASML wins punitive damages in Chinese IP theft case

ASML prospers as EUV lithography takes off

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